Ultrasonic assisted etch using corrosive liquids

ABSTRACT

An ultrasonic etching apparatus for chemically-etching a workpiece is disclosed. The apparatus includes an outer tank at least partially filled with an aqueous solution, an inner tank at least partially disposed within the outer tank and in contact with aqueous solution, the inner tank at least partially filled with an etching solution, a lid engaged with the mouth of said inner tank; and an ultrasonic transducer coupled to the outer tank to impart ultrasonic energy to the etching solution in said inner tank. Also disclosed are methods of using the apparatus to etch workpieces.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is related to co-owned U.S. patent application entitled“SURFACE TREATMENT FOR TEXTURED QUARTZ MATERIALS” (Attorney Docket No.:59081-8009.US01) filed concurrently herewith on Jul. 24, 2003 and ishereby incorporated by reference in its entirety.

FIELD OF THE INVENTION

The present invention relates to methods for ultrasonicallychemical-etching workpieces, and to systems for use in practicing theinvention.

BACKGROUND OF THE INVENTION

In a number of modern industrial processes it is necessary to etchmaterials uniformly. The etching may be confined to the material, or theetching process may be continued until the material is etched through,thereby exposing an underlying material. In many industrial applicationssuch as, for example, the fabrication of electronic, optical oroptoelectronic workpieces, the etching steps form a very critical phaseof workpiece fabrication, as the etching process typically dictates theaccuracy to which the workpieces are ultimately manufactured.

There are often more than one hundred processing steps in thefabrication of semiconductor chips, including oxidation, diffusion, ionimplantation, deposition of conductors and insulators, photolithographyand etching. Various conducting and insulating layers are depositeduniformly over the wafer to a thickness of a few microns. In criticalapplications, certain new or used parts of semiconductor processingequipment need to be cleaned prior to installation and use in order toremove residual contamination from the initial machining ormanufacturing process, or from the processing steps, in order to achievelevels of cleanliness similar to the semiconductor wafer itself and haveits surface morphology restored. Furthermore, after many wafers havebeen processed, the equipment used in the semiconductor processingprocess becomes contaminated or deposits build-up and therefore becomesunusable.

For example, in an etching machine, polymer deposits on the outercircumference of electrodes or chucks supporting the wafers until itbecomes thick enough to interfere with the wafer's contact with theelectrode. This results in non-uniform etching across the wafer as wellas missed transfers due to a wafer sticking to polymer buildup on theelectrode. Non-uniformity exceeding seven percent is beyond somespecified limits, in turn affecting side wall profile variance acrossthe wafer. In addition, other components in the equipment chamber, e.g.roofs/domes and liners are also coated with polymers and contaminantswhich contribute particles, metallic and organic impurities to thewafers. Therefore, it is then necessary to disassemble the parts in theequipment chamber and clean the individual parts. Most types of dryprocessing equipment used for the manufacture of semiconductor devicesutilize processes involving high temperatures, plasmas and gaseousmixtures for film deposition and etching. During these manufacturingprocesses, organic and inorganic by-products are deposited on thesurfaces of workpiece parts.

Some apparati and devices are commercially available to etch workpieces,however, none is ideal. FIG. 1 shows a representative small-scaleapparatus 100 of the prior art used to ultrasonically etch asemiconductor fabricationworkpiece 102. An acidic solution 110 is placedinto inner container 104 and ultrasonically agitated through aqueoussolution 120 held in outer container 130. The entire apparatus iscontained within an exhaust hood 150 for the capture of gases 140 thatare emitted from the aqueous and acidic solutions as the etchingreaction occurs. While representing an advance over earlier etchingprocesses that did not include a concentrated acid or an ultrasonicator,apparatus 100 does not provide the ability to rotate workpiece 102 orcreate safe working conditions. Nor does apparatus 100 have capabilityto contain the gases or prevent unwanted components, e.g. impuritiesfrom environment and aerosol gases from the aqueous solutions, fromentering the etching solution during the etching process, or to increasethe partial pressure of the volatilized etching solution and to preventchange in the concentration of the etching solution due to aerosol orvolatilisation losses. It also lacks a heating mechanism, probe, etc forregulating the temperature and a ultrasonic buffer for dampening anddiffusing the energy for better control over the etch process.

Prior art apparatus 200 shown in FIG. 2 contains two beakers 202 and204, which contain deionized water that is provided through opening 206,and which overflows into the beakers, which then overflows into thesonication tank 210. Ultrasonication transducer 220 is connected topower oscillator 220 to provide ultrasonic energy to the deionizedwater. This apparatus lacks a number of desired features, including,most significantly, the ability to contain an acid, the ability torotate a workpiece being sonicated, a heating element, and an ultrasonicdiffuser.

U.S. Pa. No. 6,199,563, which is incorporated by reference herein, addsa modest improvement to ultrasonicators of the prior art by including arotational mechanism for sonicating a workpiece in an acid solution, butit fails to provide means for containing the acidic gases, preventingunwanted contaminants from the aqueous solution and/or rotationalmechanism wear and tear from entering the acidic solution, the abilityto increase the partial pressure of the acidic solution, or provide asafer working environment.

What is needed is a method and apparatus for containing the gasesproduced during ultrasonic agitation, minimizing exposure of the etchingsolution to the immediately surrounding environment which would thusprevent unwanted contaminants from the aqueous solution and/orrotational mechanism wear and tear from entering the etching solutionduring the etching process, the ability to increase the partial pressureof the etching solution which would inhibit the formation of dangerousvapors by keeping them in a liquid state, keeping the concentration ofthe etching solution stable, and the ability to provide a safer workingenvironment. The present invention is designed to meet these needs byproviding a more efficient, contaminant-free apparatus and method thanthose currently available such that semiconductor workpieces can beeffectively cleaned and recycled to reduce manufacturing costs.

SUMMARY OF THE INVENTION

Accordingly, it is an object of the invention to provide, in one aspect,an ultrasonic etching apparatus for chemically-etching a workpiece. Inone embodiment, the chemical is an acid. Alternatively, the chemical isa base. The apparatus includes an outer tank at least partially filledwith an aqueous solution, an inner tank including an chemical-resistantpolymer and at least partially disposed within the outer tank and incontact with the aqueous solution. The inner tank is at least partiallyfilled with at least one liter of an acidic or basic solution having atotal acidity or basicity of at least 10% wt, and the inner tank has atleast a sidewall and a base and defining an upper mouth, and isreceptive to the workpiece. Also included in the apparatus is a lidengaged with said mouth of said inner tank, and an ultrasonic transducercoupled to said outer tank to impart ultrasonic energy to the acidicsolution in the inner tank.

In one embodiment, the weight of the lid creates at least a partial sealbetween the mouth of said inner tank and a lower surface of said lid. Ina related embodiment the partial seal functions to increase the partialpressure of the gas above the etching solution and/or to prevent escapeof chemical gases that may cause a change in the composition of thechemical solution.

In another embodiment of the invention, the apparatus includes a heatingelement for regulating the temperature of the aqueous solution.

In yet another embodiment, the apparatus includes a mechanism adapted toimpart relative motion between the workpiece disposed in the inner tankand the ultrasonic transducer. The mechanism includes, in oneembodiment, a rod extending through the lid and coupled to theworkpiece.

In still another embodiment, an exhaust hood is included which islocated above the tanks and receptive to gases produced from at leastone of the aqueous solution and the etching solution.

In yet another embodiment, an ultrasonic buffer is positioned within theaqueous solution for dampening and/or diffusing the sonic energyimparted to the acidic solution.

In one embodiment of the invention, the ultrasonic transducer ispositioned outside of the aqueous solution and is operably connected toa power oscillator.

A probe is positioned within the etching solution, in another embodimentof the invention, for monitoring one or more of the ultrasonic energy,temperature, temperature variations and impurity concentration.

In another embodiment, the aqueous solution is a filtered andrecirculated deionized water bath.

Preferably, the etching solution is essentially static.

In one embodiment, the inner tank and any portion of the rotationalmechanism that may come into contact with the etching solution comprisesa chemically-resistant polymer material selected from the groupconsisting of a fluorine resin and high density polyethylene.

In another embodiment, the inner tank generates less than 10 ppb ofleachable metal contaminants and 10 ppm of leachable anionic and organiccontaminants.

In yet another embodiment, the etching solution is acidic and includes achemical selected from the group consisting of hydrofluoric acid, nitricacid and hydrochloric acid. In a related embodiment, the acidic solutionis hydrofloric acid, nitric acid and water in a ratio of 1:1:1Alternatively, the etching solution is basic and includes a chemicalselected from the group consisting of sodium hydroxide and potassiumhydroxide.

In still another embodiment, the temperature of the aqueous solution ismaintained from about 20° C. to about 50° C.

In yet, still another embodiment, the workpiece is selected from thegroup of materials consisting of silicon carbide, quartz and silicon.

In one embodiment of the invention, the mechanism includes a rotarymotion actuator for rotating said substrate about an axis. In a relatedembodiment, the axis is a substantially horizontal axis. Alternatively,the axis is a substantially vertical axis.

In another embodiment, the mechanism includes a rotary motion actuatorfor rotating said inner tank and/or said ultrasonic transducer.

In yet another embodiment, the lid has a cross-section which issubstantially the same as the cross section of the mouth of the innertank.

In still another embodiment, the mouth of the inner tank and the lideach have a circular shape corresponding to the cross-section of thelid.

In yet another embodiment, the cross-section of the inner tank issubstantially the same as the cross section of the workpiece.

In yet, still another embodiment, the mouth of the inner tank has ashape of a square, rectangle, triangle, circle or ovals.

The inner tank of the apparatus, in another embodiment, has a shape of arectangular parallelpiped, cube or cylinder.

Accordingly, it is another object of the invention to provide, in oneaspect, a method for ultrasonically chemically-etching a workpiece. Thesteps involved in practicing the method include providing an inner tankhaving an inner surface comprising a chemical-resistant polymer anddefining an upper mouth and being receptive to the workpiece, whereinsaid inner tank is at least partially disposed within an outer tank atleast partially filled with an aqueous solution, at least partiallyfilling the inner tank with at least 1 liter of an etching solutionhaving a total acidity or basicity of at least 10%, immersing theworkpiece into the etching solution, covering the mouth of the innertank with a lid to enclose the etching solution and to increase thepartial pressure above the etching solution such that the chemicalconcentration of the etching solution remains substantially the same;and ultrasonically agitating the etching solution with an ultrasonictrasducer coupled to an outer tank to accelerate the etching of theworkpiece.

In one embodiment of the method, the weight of the lid creates at leasta partial seal between the mouth of said inner tank and a lower surfaceof said lid.

In another embodiment, method includes providing a heating element forregulating the temperature of the aqueous solution.

In still another embodiment, the method includes providing a mechanismadapted to impart relative motion between the workpiece immersed in theinner tank and the ultrasonic transducer.

In yet another embodiment, the mechanism includes a rod extendingthrough the lid and coupled to the workpiece.

In yet, still another embodiment, the method further includes providingan exhaust hood which is located above the tanks and receptive to gasesproduced from at least one of the aqueous solution and the etchingsolution.

The method, in one embodiment, further includes an ultrasonic bufferpositioned within the aqueous solution for dampening and/or diffusingthe sonic energy imparted to the etching solution.

In another embodiment, the ultrasonic transducer is positioned outsideof the aqueous solution and is operably connected to a power oscillator.

In still another embodiment, the method further includes providing aprobe positioned within the etching solution for monitoring one or moreof the ultrasonic energy, temperature, temperature variations andimpurity concentration.

In yet another embodiment, the aqueous solution is a filtered andrecirculated deionized water bath.

In yet still another embodiment, the etching solution is essentiallystatic.

The inner tank and any portion of the mechanism that may come intocontact with the etching solution, in one embodiment, includes achemically-resistant polymer material selected from the group consistingof a fluorine resin and high density polyethylene.

In another embodiment, the inner tank generates less than 10 ppb ofleachable metal contaminants and 10 ppm of leachable anionic and organiccontaminants.

In yet another embodiment, the etching solution comprises an acidselected from the group consisting of hydrofluoric acid, nitric acid andhydrochloric acid. In a related embodiment, the etching solutionincludes hydrofloric acid, nitric acid and water in a ratio of 1:1:1.

In yet another embodiment, the etching solution comprises a baseselected from the group consisting of sodium hydroxide and potassiumhydroxide. In a related embodiment, the etching solution comprises 30%potassium hydroxide.

In yet, still another embodiment, the temperature of the aqueoussolution is maintained from about 20° C. to about 50° C.

The workpiece may be silicon carbide, quartz or silicon, in oneembodiment.

In another embodiment, the mechanism includes a rotary motion actuatorfor rotating said substrate about an axis.

In yet another embodiment, the axis is a substantially horizontal axis.Alternatively, according to another embodiment, the axis is asubstantially vertical axis.

In one embodiment, the mechanism comprises a rotary motion actuator forrotating said inner tank and/or said ultrasonic transducer.

In another embodiment, the cross-section of the lid is substantially thesame as the cross section of the mouth of the inner tank.

In yet another embodiment, the mouth of the inner tank and the lid eachhave a circular shape corresponding to the cross-section of the lid.

In still another embodiment, the cross-section of the inner tank issubstantially the same as the cross section of the workpiece.

These and other objects and features of the invention will be more fullyappreciated when the following detailed description of the invention isread in conjunction with the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is an illustration of a prior art ultrasonic acid-etchingapparatus.

FIG. 2 is an illustration of a prior art ultrasonic water-cleaningoverflow apparatus.

FIG. 3 a is an illustration of an apparatus for etching a chamber partor other workpiece using an acid or base according to one embodiment ofthe invention.

FIG. 3 b is an illustration of the inner tank showing the increase inpartial pressure according to one embodiment of the invention.

FIG. 4 is an illustration of a jig for holding the outer circumferenceof a workpiece according to one embodiment of the invention.

FIG. 5 a is an enlarged view showing a screw tip of FIG. 4 according toone embodiment of the invention.

FIG. 5 b is an enlarged view showing the slotted screw tip of FIG. 4according to another embodiment of the invention.

FIG. 6 a is an illustration showing a mechanism for rotating theworkpiece around a substantially vertical axis according to oneembodiment of the invention.

FIG. 6 b is an illustration showing a mechanism for rotating theworkpiece around a substantially horizontal axis according to anotherembodiment of the invention.

FIG. 7 is a flowchart illustrating a process for ultrasonicallyacid-etching a workpiece in accordance with the present invention.

DETAILED DESCRIPTION OF THE INVENTION

I. Definitions

Unless otherwise indicated, all technical and scientific terms usedherein have the same meaning as they would to one skilled in the art ofthe present invention. It is to be understood that this invention is notlimited to the particular methodology, protocols, and reagentsdescribed, as these may vary. All publications and patents cited hereinare expressly incorporated herein by reference for the purpose ofdescribing and disclosing compositions and methodologies which might beused in connection with the invention.

As used herein, the term “etching” refers to the selective removal ofmaterial and includes, but is not limited to, cleaning, texturing andpolishing.

By “chemical-resistant polymer” is meant that the polymer compositioncan be maintained in contact with solutions of high acid or basemolarity for time sufficient to etch a workpiece, and preferably canremain in contact with the solution for extended periods of time withoutsuffering degradation of the polymer.

As used herein, “ultrasonic” generally refer to acoustic disturbances ina frequency range above about eighteen kilohertz and which extendupwards to over two megahertz.

As used herein, a “workpiece” refers to a part which is undergoing amanufacture, etching, texturing, or cleaning operation within liquidsubjected to ultrasonic energy. By way of example, one workpiece is asemiconductor wafer which has extremely small features; other examplesinclude semiconductor process chamber components such as a gasdistribution plate, dome/roof or wafer chuck. A workpiece often definescomponents in the computer industry, including disk drives,semiconductor components, and the like.

The term “lid” as it is used herein, is defined broadly to include anytype of container closure cap, cover, stopper, plug, crown, top, plateor the like, as a function of the container type, which functions as aclosure which at least partially seals the tank.

The term “hermetic seal” refers to a seal that is gas- and liquid-tightbetween two members, e.g. a mouth of a tank and a lid.

By “clean,” it is meant that the chemical-resistant polymer, e.g.polyethylene or a fluorocarbon, will not introduce contaminants into aacidic solution in excess of leachable metallic contaminants of 10 ppb,and leachable anionic and organic contaminants of 10 ppm. Thesecontaminants may be present on the surface of the material that is incontact with the etching solution, or can be “leached” from the materialof the tank or lid by the acid or base.

By “chemically inert” it is meant that the etching solutions will notsubstantially change the chemical or physical properties of thechemically-resistant polymers.

By “compatible” it is meant that the etching solutions are physicallycompatible with characteristics of the material such as the material'sporosity. In other words, a chemical sample can be considered to beincompatible with the material (even if it is chemically inert withrespect to that material) if the sample, due to small molecular size andhigh mobility, has the ability to migrate through microscopic pores inthe walls of the material.

II. Apparatus and Method of the Invention

The invention provides, in one aspect, an apparatus and integratedsystem for ultrasonically chemically-etching a workpiece. It has beendiscovered that the apparatus, as described in detail below, provides anumber of advantages over the prior art, including: minimization ofexposure of the etching solutions to the immediately surroundingenvironment which reduces unwanted contaminants from the apparatus fromentering these solutions, the ability to controllably adjust the partialpressure of the etching solution to inhibit the formation of dangerousvapors, the ability to scale-up processing of workpieces, the ability toprovide a safer working environment and to prevent the change ofchemical composition of the etching solution. Considered below are thecomponents of the apparatus.

FIG. 3 a shows an apparatus 300 according to one embodiment of theinvention. Apparatus 300 includes two inner tanks 302 and 304 formed ofor coated with a chemical-resistant polymer. Chemical-resistant polymersinclude high density hydrocarbon polymers (e.g. high densitypolyethylene) available commercially from sources such as Nalgene, Inc.(distributed by VWR in the U.S.; www.nalgene.com) and Norton PerformancePlastics Corporation (Wayne, N.J.), and fluorocarbon polymers (e.g.perfluoroalkoxy, fluorinated ethylene propylene andpolytetrafluorethylene) which are commercially available from DuPont deNemours, Inc. (Wilmington, Del.) under the tradename of Teflon(www.teflon.com).

Containers and chemicals that may be useful in certain embodiments ofthe invention are described in U.S. Pat. Nos. 5,804,744, issued Sep. 8,1998; 5,996,424, issued Dec. 7, 1999; and 6,003,666, issued Dec. 21,1999; each of which is incorporated herein by reference in its entirety.The tanks may be pre-cleaned, if desired, by, e.g. sequentially soakingthe tanks in two types of concentrated acid for around two weeks andthen rinsing for several days in ultra-pure water.

It should be noted that there are both low density polyethylene and highdensity polyethylene resins available on the market. Low densitypolyethylene is easier to work with and is more flexible (ie. more“plastic”), but is less chemically resistant than high densitypolyethylene. The present invention contemplates the use of a “mediumdensity” polyethylene by mixing low density polyethylene resin with highdensity polyethylene resin to produce a blend that is easier to workwith and more flexible than high density polyethylene, but which is morechemically resistant than low density polyethylene.

The described materials are preferred because they can be manufacturedin a clean fashion, are chemically inert to the chemicals of interest,and are compatible with the chemicals of interest. Since all three ofthese features are important, the terms “clean”, “chemically inert”, and“chemically compatible” have been described in greater detail in SectionI, above.

Of the two preferred material types of the present invention,polyethylene is desirable in that it is relatively inexpensive and iseasier to work with than fluorocarbon polymers. When manufactured into atank and/or lid of the present invention, the resultant article ofmanufacture includes less than 10 part per billion (ppb) of leachablemetallic contaminants and less than 10 part per million (ppm) ofleachable anionic and organic contaminants, both on the surface of thearticle and being extracted from the materials of the article ofmanufacture by the etching solutions.

Fluorocarbon polymers are relatively more expensive and are harder towork with, but have the advantage of being commonly accepted in thesemiconductor industry for high purity applications. The apparatus ofthe present invention includes, in a preferred embodiment, the use of afluorocarbon inner tank and/or lid which have leachable metalliccontaminants of less than 1 ppb, and extractable anionic and organiccontaminants less than 1 ppm.

The aforementioned materials have been found to be chemically inert andcompatible with most chemicals used in the manufacture ofsemiconductors. For example, the materials of the inner tank and lid ofthe present invention are both chemically inert and compatible withhydrofluoric acid (HF), hydrochloric acid (HCL), sulfuric acid (H₂SO₄),phosphoric acid (H₃PO₄), nitric acid (HNO₃), acetic acid (CH_(3C)OOH),hydrogen peroxide (H₂O₂), ammonium hydroxide (NH₄OH), tetramethylammonium hydroxide (TMAH), sodium hydroxide (NaOH), potassium hydroxide(KOH) and isopropyl alcohol (IPA). Fluorocarbon embodiments of thepresent invention, in particular, are chemically inert and compatiblewith all of the mentioned chemicals.

With reference again to FIG. 3 a, the inner tanks 302 and 304 are atleast partially disposed within outer tank 306, and include sidewalls310 and 312, bases 314 and 316 and mouths 318 and 320. Outer tank 306 isat least partially filled with an aqueous solution 308 capable oftransmitting ultrasonic energy. Preferably, the aqueous solution iswater. In an embodiment not shown, the outer tank may include acirculator that removes particles by filtering the aqueous solution andreturning it to the outer tank. In order to minimize decreases in thetemperature of the aqueous solution described above, an aqueous solutionheating element may be provided on the aqueous solution supply and/orcirculation line, if any, to preheat the aqueous solution to apredetermined temperature before being supplied into the outer tank.

Inner tanks 302 and 304 are at least partially filled with an etchingsolution 322, such as hydrofluoric acid, nitric acid and/or hydrochloricacid; or bases such as NaOH or KOH, for cleaning, etching and/ortexturing workpiece 305, which is typically formed of silicon, ceramic(e.g., AlN, Al₂O₃), quartz and/or silicon carbide. Thechemically-resistant polymers should not introduce contaminants such asmetals, anions and organics into the acidic solution. The inner tankspreferably generate less than 10 ppb of leachable metal contaminants and10 ppm of leachable anionic and organic contaminants.

Preferably, the tanks are filled with at least one liter, morepreferably at least ten liters, and even more preferably at least thirtyliters of the etching solution. The total acidity or basicity will varyaccording to the desired application or workpiece, but will typicallyrange from about 1% to about 40%. A preferable acidity or basicity is atleast about 10%. The etching solution includes acids, such ashydrofluoric acid, nitric acid and water in various ratios, e.g., 1:1:1,1:2:2, or 1:7:2. In another embodiment, the etching solution comprisesvarious ratios of basic solutions, e.g. 5-50% or 20-30% KOH and 50-95%or 70-80% water, respectively. The etching solution may be adjusteddepending on the substrate, time, temperature, etch depth,movement/rotation of the workpiece and/or other parameters as will beapparent to those of skill in the art. Exemplary ratios of acids andbases for etching quartz and polysilicon substrates are described inExamples 1-3.

Lids 324 and/or 326 are placed on top of inner tank mouths 324 and 326,the shape of which may be square, rectangle, triangle, circle, oval orthe like. Preferably, the cross-section of the lids are substantiallythe same as the cross-section of the mouth of the inner tank mouths. Thelids create at least a partial seal between the mouth of the inner tanksand the lower surfaces of the lids. In one embodiment, the seal is ahermetic seal. As indicated in FIG. 3 b, it should be appreciated thatthe lid 326 also functions to increase the partial pressure of the gases395 above the etching solution 322 such that less aerosol formationand/or vaporization of the etching solution occurs by keeping it in aliquid state and preventing a concentration change of the etchingsolution. In one embodiment, the lid also functions as a simple safetyvalve capable of releasing pressure before dangerous levels areachieved, e.g. before the etching solution reaches a certaintemperature. The lid is also preferably formed of a chemical-resistantpolymer. For gases that may escape from the inner or outer tanks, anexhaust hood 370 is provided which is located above the tanks andreceptive to and/or compatible with these gases.

In one embodiment of the invention, an at least partly deformable,chemical-resistant coating of e.g. a medium-density polyethylene orTeflon®, as described above, is provided on the mouth of the inner tankand/or bottom surface of the lid and is compressed on sealing the innertank with the lid. Under pressure and heat the coating undergoesdeformation and consequently forms a sealing closure of the inner tankinterior. This is particularly advantageous during etching of the atleast partially filled sealed inner tank, so as to ensure that duringetching the inner tank does not leak due to the pressure occurring inthe interior thereof. The deformable coating provided in this embodimentalso has the advantage of permitting a tighter seal, if desired,following extended use of the inner tank and/or lid.

Apparatus 300 also includes an ultrasonic transducer 330 which iscoupled to power oscillator 336 and outer tank 306 such that it impartsultrasonic energy to etching solution 322 in inner tanks 302 and 304.The ultrasonic transducer agitates chemical solution 322 through aqueoussolution 308 to accelerate the etching of workpiece 305. In theembodiment shown, the ultrasonic transducer is positioned outside of theaqueous solution. However, in another embodiment, the transducer ispositioned within the aqueous solution. A plurality of ultrasonictransducers may be employed, if desired, as described, e.g. In U.S. Pat.No. 6,181,052 (Jan. 30, 2001), entitled “Ultrasonic generating unithaving a plurality of ultrasonic transducers,” which is incorporatedherein by reference. Ultrasonic transducers may be purchasedcommercially from a number of sources such as Branson or Misonix(www.misonix.com). Methods for controlling various frequency ranges ofultrasonic energy are described in U.S. Pat. No. 6,433,460 (Aug. 13,2002), which is incorporated by reference herein. Ultrasonic energy istypically between 25-40 kHz or greater. However, the energy may beadjusted as desired depending on additional parameters as discussedabove. Ultrasonic power typically ranges from 30-50 watts/gallon, butmay also be varied to include powers that are less or greater than thisrange.

A heating element 332 is also included in apparatus 300. The heatingelement is thermally coupled to the side wall of outer tank 306 suchthat it may be used for regulating the temperature of aqueous solution308. It has been discovered that controllable chemical etching may beachieved at higher temperatures. The temperature is inverselyproportional to the time required for etching the workpiece and may berelated to additional parameters as discussed above. Thus, an advantageof coupling the heating element to the apparatus of the invention isthat time required for etching may be reduced, which allows for anincrease the throughput for etching a plurality of workpieces.Typically, the temperature is adjusted to between about 18-45 degreesCentigrade.

Apparatus 300 also includes mechanisms 340 and 350 for rotation suchthat relative motion is achieved between workpiece 305 and ultrasonictransducer 330. Mechanism 340 includes a motor 342 and rod 344 extendingthrough lid 326 for rotating substrate 305 about a vertical axis.However, the rotating mechanism is not limited to the constructionshown, and may be modified with bevel gears, belts or the like totransmit a driving torque by the motor 342 to rod 344 such thatsubstrate 305 is rotated about a substantially horizontal axis. See,e.g. U.S. Pat. No. 6,199,563 (Mar. 13, 2001), which is incorporated byreference herein. Alternatively, turntable 360 may be rotated bymechanism 350, which includes motor 352 and means 354 for generating asignal for the rotation of turntable 360. Alternatively, or incombination with the rotation of the workpiece, ultrasonic transducer330 may be rotated such that relative motion is achieved between theworkpiece disposed in the inner tank and the ultrasonic transducer. In apreferable embodiment, the workpiece is rotated slowly, e.g. from about1 rpm to about 20 rpm, such that uniform etching of the workpiece isachieved.

An ultrasonic buffer 380 is positioned within the aqueous solution fordampening and/or diffusing the sonic energy imparted to etching solution322. This diffusion and dampening of the energy allows greater controlover the etching process. Thus, although the material for forming thebuffer is preferably a chemical-resistant polymer, the dimensions of thebuffer will vary depending on the amount of energy dampening ordiffusion desired.

A probe 390 is positioned within etching solution 322 for monitoring theultrasonic energy, temperature, temperature variations, impurityconcentrations and the like of any of the components of the apparatus,e.g. the etching solution and/or aqeous solution. The probe ispreferably formed of, or coated with, an acid-resistant polymer asdescribed above. One or more additional probes, not shown, may bepositioned within or near any of the components of the apparatus formonitoring any of the parameters described above. In one embodiment, theaqueous solution is maintained from about 20° C. to about 50° C. Becausethe inner tank is immersed in the aqueous solution, the etching solutionhas substantially the same temperature as is maintained in the aqueoussolution. As noted above, typically, the higher the temperature of theetching solution, the higher the rate of the etching process, andtherefore the faster the workpiece has material removed from itssurface. Thus, the temperature of the aqueous solution and the time theworkpiece remains in the etching solution are dependent upon the amountof material sought to be removed from the workpiece. These parametersmay be adjusted accordingly by one of skill in the art, and aretypically adjusted to achieve a uniform etch depth of between about 1 toabout 1000 μm, depending on the application, e.g., removal of damage,etc. Exemplary time and temperature parameters for etching variousdepths workpieces at various rates are given in Examples 1-3.

In order to increase laboratory throughput and to further decreaseexposure of laboratory workers to the hazardous reagents describedherein, robotic systems which incorporate one or more of the componentsof the apparatus and/or the method steps may be employed. For example,robotic introduction of solutions (acidic, basic or aqueous) into thetanks, rotations of the workpiece and/or transducer and temperaturecontrol may be performed to enhance throughput of the etching process.Thus, in one embodiment of the invention, the inoculating step isperformed by a robotic or automated system that has been developed forperforming such a task.

Any of the operations to be performed, as described below, on individualmembers (e.g. workpieces, inner or outer tanks, transducers, probes,etc.) can be performed sequentially or in parallel. Certain physicalformats are well suited to parallel operations (i.e., having the same orsimilar operations performed by approximately simultaneous additions ofrelevant solutions to the tanks, or approximately simultaneous removalof workpieces from the tanks, and/or other operations). Robotic or othermanipulations can be performed such that the actual motions used toachieve selective or parallel manipulations can be controlled byappropriate controller devices, e.g., computers linked to roboticelements with software comprising instruction sets for regulating therobotic or other material manipulative elements. These computercontrolled, automated workstations may include robotic arms which mimicthe manual operations performed by a scientist. The nature andimplementation of modifications to these devices (if any) such that theycan operate as discussed herein will be apparent to persons skilled inthe relevant art.

The apparatus and method of the invention may also be used incombination with the methods, apparati and chemicals described inco-owned U.S. Ser. No. 09/945,259, filed Aug. 21, 2001, entitled“Cleaning of Semiconductor Process Equipment Chamber Parts Using OrganicSolvents” (Atty Docket No: 59081-8006.US01) and U.S. Ser. No.09/927,263, filed Aug. 10, 2001, entitled “System and Method forCleaning Semiconductor Fabrication Equipment Parts” (Atty Docket No:59081-8005.US01); each of which is incorporated by reference in itsentirety herein.

FIG. 4 shows a jig 402 adapted to allow screws 404, 406 and 408 to beextended therethrough such that the tips of the screws secure theworkpiece 410 in place. The jig and screws are formed of achemically-resistant polymer, as described above. Following the securingof workpiece 410 to jig 402, the entire device may be positioned withinan inner tank as described above such that screws 404, 406 and 408 arein contact with the inner surface of the inner tank. Such aconfiguration holds the workpiece in place relative to the inner tankduring ultrasonic agitation. The jig may be adapted to connect with arotational mechanism as described above.

As shown in FIG. 5 a, a screw with a substantially pointed tip may beused to secure, e.g. a cylindrical shaped workpiece, while a slottedscrew 504 as illustrated in FIG. 5 b may be used to secure a wafershaped workpiece 510.

FIGS. 6 a and 6 b show variations on the rotational motion that may beachieved by the present invention. FIG. 6 a shows three workpieces 602,604 and 606 connected through connecting rods 610, 612, 614 and 616. Theworkpieces are coupled to rotational mechanism rod 644 which isconnected to motor 642 for rotating the workpieces in a substaniallyhorizontal direction with respect to the base 616 of inner tank 600.Alternatively, as shown in FIG. 6 b, workpieces 602, 604 and 606connected through connecting rods 610, 612, 614 and 616, are coupled torotational mechanism rod 644 which is further coupled to horizontal rod618, which is suspended in the inner tank with suspension bars 630 and632. Rotational mechanism rod 644 is is connected to motor 642 forrotating the workpieces in a substantially vertical direction withrespect to the base 616 of inner tank 600.

FIG. 7 shows a process 700 for ultrasonically etching a workpiece inaccordance with one embodiment of the invention. The process 700 startsin operation 710 by providing an inner tank having an inner surface. Theinner surface includes a chemically-resistant polymer. The inner tankhas an upper mouth that is receptive to a workpiece, and the tank is atleast partially disposed within an outer tank which has been at leastpartially filled with an aqueous solution. The inner tank is then filledwith at least one liter, preferably 10 and more preferably 30 liters ofan etching solution having a total acidity or basicity of at least about10%, as given in operation 720. In operation 730, the workpiece istotally immersed into the etching solution. The mouth of the inner tankis then covered in operation 740 with a lid to enclose the etchingsolution and to increase the partial pressure above the acidic solution.According to operation 750, the etching solution is then ultrasonicallyagitated with an ultrasonic transducer coupled to the outer tank toaccelerate the etching of the workpiece.

The workpiece can be removed after a predetermined period of time tovisually inspect and/or test levels of impurities or the degree ofetching of the workpiece.

VII. Examples

The following examples further illustrate the invention described hereinand are in no way intended to limit the scope of the invention.

EXAMPLE 1

For the acidic etching of a quartz workpiece using a 1:1:1 ratio ofhydrofluoric acid (49% wt)/nitric acid (70% wt)/water mixture, whichcorresponds to an acid concentration of 16% wt for HF and 23% wt forHNO₃, at 20±5° C., with an ultrasonic energy of 25 to 40 kHz and anultrasonic power of 30-50 watts/gallon, an etch of 0.5 μm per minute wasobtained.

EXAMPLE 2

A quartz insulator ring from a semiconductor tool is ultrasonicallyetched with 1:1:1 or 1:2:2 volume ratios of hydrofluoric acid (49%wt)/nitric acid (70% wt)/water at 20±5° C. with an ultrasonic energy of25 to 40 kHz and an ultrasonic power of 30-50 watts/gallon, to etch off5 to 100 μm of material. The 1:1:1 volume ratio is 16% wt HF and 23% wtHNO₃ and for the 1:2:2 ratio is 10% wt HF and 30% wt HNO₃.

EXAMPLE 3

Polysilicon was isotropically or anisotropically etched using acidic andbasic ultrasonic assisted etching processes to remove 5 to 200 μm ofmaterial. In one example, a 1:7:2 ratio of hydrofluoric acid (49%wt)/nitric acid (70% wt)/water, which corresponds to a 5% wt forhydrofluoric acid and 7% wt for nitric acid, at 20±5° C. with anultrasonic energy of 25 to 40 kHz and an ultrasonic power of 30-50watts/gallon was used to remove the material. In another example, a 30%potassium hydroxide solution at 20±5° C. with an ultrasonic energy of 25to 40 kHz and an ultrasonic power of 30-50 watts/gallon was used toremove the material.

Although the invention has been described with respect to particularembodiments, it will be apparent to those skilled in the art thatvarious changes and modifications can be made without departing from theinvention.

1. An ultrasonic etching apparatus for chemically-etching a workpiece,said apparatus comprising an outer tank at least partially filled withan aqueous solution; an inner tank comprising a chemically-resistantpolymer and at least partially disposed within said outer tank and incontact with said aqueous solution, said inner tank at least partiallyfilled with at least 1 liter of an etching solution having a totalacidity or basicity of at least 10% wt, said inner tank having at leasta sidewall and a base and defining an upper mouth, and being receptiveto the workpiece; a lid engaged with said mouth of said inner tank,wherein the weight of the lid creates at least a partial seal betweenthe mouth of said inner tank and a lower surface of said lid to increasethe partial pressure of the gas above the etching solution; and anultrasonic transducer coupled to said outer tank to impart ultrasonicenergy to said etching solution in said inner tank.
 2. The apparatus ofclaim 1, further comprising a heating element for regulating thetemperature of the aqueous solution.
 3. The apparatus of claim 1,further comprising a mechanism adapted to impart relative motion betweenthe workpiece disposed in said inner tank and said ultrasonictransducer.
 4. The apparatus of claim 3, wherein the mechanism comprisesa rod extending through the lid and coupled to the workpiece.
 5. Theapparatus of claim 1, further comprising an exhaust hood which islocated above the tanks and compatible with gases produced from at leastone of the aqueous solution and the etching solution.
 6. The apparatusof claim 1, further comprising an ultrasonic buffer positioned withinthe aqueous solution for dampening and/or diffusing the sonic energyimparted to the etching solution.
 7. The apparatus of claim 1, whereinthe ultrasonic transducer is positioned outside of the aqueous solutionand is operably connected to a power oscillator.
 8. The apparatus ofclaim 1, further comprising a probe positioned within the etchingsolution for monitoring one or more of the ultrasonic energy,temperature, temperature variations and impurity concentration.
 9. Theapparatus of claim 1, wherein the aqueous solution is a filtered andrecirculated deionized water bath.
 10. The apparatus of claim 1, whereinthe etching solution is essentially static.
 11. The apparatus of claim1, wherein the inner tank and any portion of the rotational mechanismthat may come into contact with the etching solution comprises amaterial selected from the group consisting of a fluorine resin and highdensity polyethylene.
 12. The apparatus of claim 11, wherein the innertank generates less than 10 ppb of leachable metal contaminants and 10ppm of leachable anionic and organic contaminants.
 13. The apparatus ofclaim 1, wherein the etching solution comprises an acid selected fromthe group consisting of hydrofluoric acid, nitric acid and hydrochloricacid.
 14. The apparatus of claim 13, wherein the acidic solutioncomprises hydrofluoric acid, nitric acid and water in a ratio selectedfrom the group consisting of 1:1:1, 1:2:2 and 1:7:4.
 15. The apparatusof claim 1, wherein the temperature of the aqueous solution ismaintained from about 20° C. to about 50° C.
 16. The apparatus of claim1, wherein the workpiece is selected from the group consisting ofsilicon carbide, quartz, ceramic and silicon.
 17. The apparatus of claim3, wherein the mechanism comprises a rotary motion actuator for rotatingsaid substrate about an axis.
 18. The apparatus of claim 17, wherein theaxis is a substantially horizontal axis.
 19. The apparatus of claim 17,wherein the axis is a substantially vertical axis.
 20. The apparatus ofclaim 3, wherein the mechanism comprises a rotary motion actuator forrotating said inner tank and/or said ultrasonic transducer.
 21. Theapparatus of claim 1, wherein the cross-section of the lid issubstantially the same as the cross section of the mouth of the innertank.
 22. The apparatus of claim 21, wherein the mouth of the inner tankand the lid each have a circular shape corresponding to thecross-section of the lid.
 23. The apparatus of claim 1, wherein thecross-section of the inner tank is substantially the same as the crosssection of the workpiece.
 24. The apparatus of claim 1, wherein themouth of the inner tank has a shape selected from the group consistingof a square, rectangle, triangle, circle and oval.
 25. The apparatus ofclaim 1, wherein the inner tank has a shape selected from the groupconsisting of a rectangular parallelpiped, cube and cylinder.
 26. Theapparatus of claim 1, wherein the etching solution comprises a baseselected from the group consisting of sodium hydroxide and potassiumhydroxide.
 27. The apparatus of claim 26, wherein the etching solutioncomprises 30% potassium hydroxide.
 28. (canceled)